Estimation of uncertainties in XAFS data.
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Biomedical subjects
Publications and source records attributed to B I Boyanov.
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The capabilities and performance of a UHV system for in situ studies of metal-semiconductor interactions are described. The UHV system consists of interconnected deposition and analysis chambers, each of which is capable of maintaining a base pressure of approximately 1 x 10(-10) torr. The deposited materials and their reaction products can be studied in situ with RHEED, XAFS, AES, XPS, UPS and ARUPS. Results from a study of the reaction of 0.7- and 1.7-monolayer-thick films of cobalt with strained silicon-germanium alloys are presented. The signal-to-noise ratio obtained in these experiments indicates that the apparatus is capable of supporting in situ EXAFS studies of approximately 0.1-monolayer-thick films.
A new method for analysis of EXAFS data from coordination shells containing two types of atoms distributed at two well defined distances is proposed. The method, which in effect isolates the individual contributions of the two subshells, can be viewed as a refinement of conventional techniques such as beat analysis and multi-shell least-squares fitting. No external information on the structure of any of the contributing subshells is required beyond the usual assumption of small or ;Gaussian' disorder. As much as fivefold reduction in the confidence limits of the coordination numbers in comparison with unrestricted multi-shell fits is demonstrated. The range of applicability and limitations of the method are discussed in detail.