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Byron D Gates

Publications and source records attributed to Byron D Gates.

5 recordsLinked to original sources

Water-soluble sacrificial layers for surface micromachining.

This manuscript describes the use of water-soluble polymers for use as sacrificial layers in surface micromachining. Water-soluble polymers have two attractive characteristics for this application: 1) They can be deposited conveniently by spin-coating, and the solvent removed at a low temperature (95-150 degrees C), and 2) the resulting layer can be dissolved in water; no corrosive reagents or organic solvents are required. This technique is therefore compatible with a number of fragile materials, such as organic polymers, metal oxides and metals-materials that might be damaged during typical surface micromachining processes. The carboxylic acid groups of one polymer-poly(acrylic acid) (PAA)-can be transformed by reversible ion-exchange from water-soluble (Na+ counterion) to water-insoluble (Ca2+ counterion) forms. The use of PAA and dextran polymers as sacrificial materials is a useful technique for the fabrication of microstructures: Examples include metallic structures formed by the electrodeposition of nickel, and freestanding, polymeric structures formed by photolithography.

Acrylic Resins↗

Fabrication of metal structures with nanometer-scale lateral dimensions by sectioning using a microtome.

This Communication describes the fabrication of planar structures comprising metallic features with nanometer-scale lateral dimensions in polymer prepared by sectioning a thin metallic film, embedded in a polymer matrix, in a plane perpendicular to the metallic film. This procedure converts a structure that is thin along the z-axis into a structure that is thin along the x-axis. The embedded thin metal film is still conductive and can be used as a nanoelectrode. The structure and composition of the exposed nanoedge can be easily tuned by changing the structure of the surface supporting the metal film, and the composition and the thickness of that film.

Journal Article↗

Replication of vertical features smaller than 2 nm by soft lithography.

This communication demonstrates a simple, soft lithographic approach to the replication and metrology of nanoscale vertical displacements. We patterned test structures with regular patterns that minimize artifacts in measurements by atomic force microscopy. A composite stamp of poly(dimethylsiloxane) (PDMS) molded against the original test structure served as a template to generate polyurethane replicas. We replicated vertical displacements down to approximately 1.5 nm. This replication demonstrates the capability of soft lithography to reproduce features with dimensions similar to those of large molecules.

Nanotechnology↗