Biomedical subjects

Dae-Geun Choi

Publications and source records attributed to Dae-Geun Choi.

7 recordsLinked to original sources

PubMed2006

Patterned arrays of au rings for localized surface plasmon resonance.

In this paper, we examined the characteristic behavior of localized surface plasmon resonances (LSPR) of Au dot and ring arrays in response to the selective binding of biomolecules. To do this, patterned arrays of Au rings and dots with various feature scales were fabricated over large areas by an imprint lithography technique. Our results showed that the LSPR spectra of the Au nanorings exhibited a blue shift with increase in the ring widths and asymptotically converged to those for Au nanodots. This clearly implies that the LSPR spectra can be tuned over an extended wavelength range by varying the ring width. For an illustrative purpose, the patterned Au structures were used to detect the binding of streptavidin to biotin. In doing this, the Au patterns were chemically modified with G4 dendrimers of amine terminated poly(amidoamine), which facilitated the tethering of biotin onto the Au pattern. Exposure of the biotinylated Au nanorings to aqueous streptavidin solution induced both red-shifts of the LSPR spectra and changes in the peak intensities. The sensitivity of the LSPR spectra to the binding of the biomolecules was enhanced as the ring width of Au rings was decreased.

Biotin↗

PubMed2006

Nanoscopic Pd line arrays using nanocontact printed dendrimers.

High-density Pd line arrays with 55 nm line-width were obtained using nanocontact-printed dendrimer monolayers. Elastomeric PDMS stamps for nanocontact printing were replicated from silicon master molds which were fabricated by UV nanoimprinting in combination with reactive ion etching. The fabrication method effectively controlled the aspect ratios of high-density lines for resolving the problems encountered in both replicating silicon masters to PDMS stamps and printing with the replicated PDMS stamps. Using the PDMS nanostamp with an optimized aspect ratio, a self-assembled monolayer of dendrimer was patterned on a Pd film via nanocontact printing, which was facilitated by the strong interaction between Pd and amine groups of the dendrimer. The patterned self-assembled monolayer was used as an etch-resist mask against the wet etchant of Pd, leaving behind a high-density Pd line array over large areas. The resulting functional Pd nanopattern is of practical significance in microelectronics and bio- or gas-sensing devices.

Journal Article↗

PubMed2006

Nanomachining by colloidal lithography.

Colloidal lithography is a recently emerging field; the evolution of this simple technique is still in progress. Recent advances in this area have developed a variety of practical routes of colloidal lithography, which have great potential to replace, at least partially, complex and high-cost advanced lithographic techniques. This Review presents the state of the art of colloidal lithography and consists of three main parts, beginning with synthetic routes to monodisperse colloids and their self-assembly with low defect concentrations, which are used as lithographic masks. Then, we will introduce the modification of the colloidal masks using reactive ion etching (RIE), which produces a variety of nanoscopic features and multifaceted particles. Finally, a few prospective applications of colloidal lithography will be discussed.

Colloids↗

PubMed2005

Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography.

In this paper, we fabricated a fluorinated organic-inorganic hybrid mold using a nonhydrolytic sol-gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecules in the backbone. The other advantages of the hybrid mold are thermal stability over 300 degrees C. The hybrid mold produced from UV nanoimprint lithography (UV-NIL) was used as a mold for the next UV-NIL and soft lithography without requiring use of an antisticking layer. Various nanometer scale patterns including sub-100 nm patterns could be obtained from the hybrid mold. Nanopatterning processes using this low-cost mold are useful because they preserve the expensive original master.

Journal Article↗

PubMed2005

Particle arrays with patterned pores by nanomachining with colloidal masks.

In summary, we have developed a new strategy for the fabrication of arrayed colloidal particles well-ordered nanometric holes of three or four fold symmetry by anisotropic reactive ion (plasma) etching of self-organized layers of colloidal spheres. We demonstrated that a mesoporous silica matrix with regular open windows could be used as a lithographic mask and the resulting arrangement of pores on a particle was dependent on the orientation of the colloidal particle stacking. A variety of organic and inorganic materials such as metals for metal-polymer composites, DNA and proteins, semiconducting and ceramic materials, and other polymers and small chemicals can be incorporated via chemical and physical attachment. Particles with patterned pores and composite particles by our nanomachining process can be used as novel functional materials in the field of electronics, photonics, and biotech areas.

Journal Article↗

PubMed2004

Colloidal lithographic nanopatterning via reactive ion etching.

We report here a novel colloidal lithographic approach to the fabrication of nonspherical colloidal particle arrays with a long-range order by selective reactive ion etching (RIE) of multilayered spherical colloidal particles. First, layered colloidal crystals with different crystal structures (or orientations) were self-organized onto substrates. Then, during the RIE, the upper layer in the colloidal multilayer acted as a mask for the lower layer and the resulting anisotropic etching created nonspherical particle arrays and new patterns. The new patterns have shapes that are different from the original as a result of the relative shadowing of the RIE process by the top layer and the lower layers. The shape and size of the particles and patterns were dependent on the crystal orientation relative to the etchant flow, the number of colloidal layers, and the RIE conditions. The various colloidal patterns can be used as masks for two-dimensional (2-D) nanopatterns. In addition, the resulting nonspherical particles can be used as novel building blocks for colloidal photonic crystals.

Journal Article↗

PubMed2003

Effect of two-step sol-gel reaction on the mesoporous silica structure.

In the present study, we investigated the effects of two-step sol-gel reaction by abrupt pH change on the SBA-15 and mesocellular silica foams (MCF). Mesoporous silica was fabricated by using triblock copolymer templates (poly(ethylene oxide) and poly(propylene oxide)). The prepared silica structure was characterized by X-ray diffraction, transmission electron microscopy, and N(2) sorption experiment. Specifically, we prepared SBA-15 with long-range two-dimensional hexagonal arrangement of 3 to 6-nm feature spacing and MCF with larger pores of a few tens of nanometers. The pore size and ordering were influenced by pH change in a two-step sol-gel reaction and the concentration of organic solvent. Although well-ordered hexagonal arrangement of mesopores was prevalent in acidic conditions, the materials synthesized by a single-step reaction in neutral or basic conditions possessed gel-like structure without mesopores. However, the present two-step reaction (low pH sol-gel reaction followed by high pH reaction) not only produced mesoporous materials but also provided controllability of the pore size. In particular, mesoporous structures with pore sizes as large as those of MCF were successfully fabricated by the two-step reaction without using organic swelling agents. As expected, when xylene was added as a swelling agent, the pore size increased with the xylene/copolymer weight ratio.

Ammonium Hydroxide↗