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G M W Kroesen

Publications and source records attributed to G M W Kroesen.

6 recordsLinked to original sources

Characterization of a vacuum-arc discharge in tin vapor using time-resolved plasma imaging and extreme ultraviolet spectrometry.

Discharge sources in tin vapor have recently been receiving increased attention as candidate extreme ultraviolet (EUV) light sources for application in semiconductor lithography, because of their favorable spectrum near 13.5 nm. In the ASML EUV laboratory, time-resolved pinhole imaging in the EUV and two-dimensional imaging in visible light have been applied for qualitative characterization of the evolution of a vacuum-arc tin vapor discharge. An EUV spectrometer has been used to find the dominant ionization stages of tin as a function of time during the plasma evolution of the discharge.

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Stark broadening experiments on a vacuum arc discharge in tin vapor.

Pinched discharge plasmas in tin vapor are candidates for application in future semiconductor lithography tools. This paper presents time-resolved measurements of Stark broadened linewidths in a pulsed tin discharge. Stark broadening parameters have been determined for four lines of the Sn III spectrum in the range from 522 to 538 nm, based on a cross-calibration to a Sn II line with a previously known Stark width. The influence of the electron temperature on the Stark widths is discussed. Results for the electron densities in the discharge are presented and compared to Thomson scattering results.

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Collective Thomson scattering experiments on a tin vapor discharge in the prepinch phase.

Partially collective Thomson scattering measurements have been performed on a triggered vacuum arc in tin vapor, which is a candidate source of extreme ultraviolet light for application in semiconductor lithography. In this paper, results on the electron densities and temperatures are presented for the prepinch phase of the discharge. Electron densities and temperatures increase from 1 x 10(23) m(-3) to 1 x 10(24) m(-3) and from 5 eV to over 30 eV, respectively, in about 100 ns. The results are confirmed by Stark broadening data.

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Time-resolved pinhole camera imaging and extreme ultraviolet spectrometry on a hollow cathode discharge in xenon.

A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV detector, and a digital camera have been installed on the ASML EUV laboratory setup to perform time-resolved pinhole imaging and EUV spectroscopy on a copy of the Philips EUV hollow cathode discharge plasma source. The main properties of the setup have been characterized. Time-resolved measurements within the plasma pulse in the EUV have been performed on this source. Specific features of the plasma, such as a ring shape in the initiation phase and a propagating sphere during the pinch phase, have either been discovered or confirmed experimentally. Relative populations of various ionization stages in the pinch plasma have been estimated on the basis of line intensities and calculated transition probabilities. The changes in relative line intensities of a single ionization stage can be explained by a combination of temperature and excitation/deexcitation balance effects. Experiments with argon dilution on a newer version of the source show considerable effect on the shape of the xenon EUV spectrum.

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Evolution of a dust void in a radio-frequency plasma sheath.

The onset and growth of a dust void are investigated in a radio-frequency (rf) sheath of a capacitively coupled argon plasma. A circularly symmetric void emerges and grows with increasing rf power and pressure in the central region of the dust cloud levitating in the sheath. Experimental measurements of the void diameter are compared with the predictions of a simple phenomenological theory, based on a balance of forces on dust grains.

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Dynamic Mach cone as a diagnostic method in reactive dusty plasma experiments.

We demonstrate how the observation of dynamic Mach cones in dusty plasma experiments allows one to follow the evolution of the dust acoustic wave velocity as charges on dust particles change, or as their mass changes. In experiments in which only the charge is changing due to, e.g., the application of a thin coating on UV-illuminated dust particles, the coating rate may be inferred through the analysis of the Mach cone pattern. In other experiments where the dust sizes are changing, also leading to some change in charge, the growth rate can be followed.

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