Biomedical subjects

Hakan Urey

Publications and source records attributed to Hakan Urey.

3 recordsLinked to original sources

PubMed2006

High-resolution beam steering using microlens arrays.

Imaging or beam-steering systems employing a periodic array of microlenses or micromirrors suffer from diffraction problems resulting from the destructive interference of the beam segments produced by the array. Simple formulas are derived for beam steering with segmented apertures that do not suffer from diffraction problems because of the introduction of a moving linear phase shifter such as a prescan lens before the periodic structure. The technique substantially increases the resolution of imaging systems that employ microlens arrays or micromirror arrays. Theoretical, numerical, and experimental results demonstrating the high-resolution imaging concept using microlens arrays are presented.

Equipment Design↗

PubMed2005

Microlens-array-based exit-pupil expander for full-color displays.

Two-dimensional arrays of microlenses can be used in wearable display applications as numerical aperture expanders or exit-pupil expanders (EPEs) to increase the size of the display exit pupil. A novel EPE approach that uses two microlens arrays (MLAs) is presented. The approach is based on cascading two identical microlens arrays spaced precisely at one focal-length distance with submicrometer registration tolerances relative to each other. The ideal MLA for this application requires a 100% fillfactor, sharp seams between microlenses, and a perfect spherical profile. We demonstrate a dual-MLA-based EPE that produces excellent exit-pupil uniformity and better than 90% diffraction efficiency for all three wavelengths in a color-display system. Two-MLA registration is performed with submicrometer precision by use of far-field alignment techniques. Fourier optics theory is used to derive the analytical formulas, and physical optics beam propagation is used for numerical computations. Three MLA fabrication technologies, including gray-scale lithography, photoresist reflow, and isotropic etching, are evaluated and compared for an EPE application.

Color↗

PubMed2004

Spot size, depth-of-focus, and diffraction ring intensity formulas for truncated Gaussian beams.

Simple polynomial formulas to calculate the FWHM and full width at 1/e2 intensity diffraction spot size and the depth of focus at a Strehl ratio of 0.8 and 0.5 as a function of a Gaussian beam truncation ratio and a system f-number are presented. Formulas are obtained by use of the numerical integration of a Huygens-Fresnel diffraction integral and can be used to calculate the number of resolvable spots, the modulation transfer function, and the defocus tolerance of optical systems that employ laser beams. I also derived analytical formulas for the diffraction ring intensity as a function of the Gaussian beam truncation ratio and the system f-number. Such formulas can be used to estimate the diffraction-limited contrast of display and imaging systems.

Journal Article↗