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Henry I Smith

Publications and source records attributed to Henry I Smith.

8 recordsLinked to original sources

Multistage high-order microring-resonator add-drop filters.

We propose and demonstrate a multistage design for microphotonic add-drop filters that provides reduced drop-port loss and relaxed tolerances for achieving high in-band extinction. As a result, the first microring-resonator filters with a rectangular notch stopband in the through port (to our knowledge) are shown, with extinctions exceeding 50 dB. Reaching 30 dB beyond previous results, without postfabrication trimming, such extinction levels open the door to microphotonic notch circuits for spectroscopy, wavelength conversion, and quantum cryptography applications. Combined with a low-loss, high-index-contrast electromagnetic design in SiN and frequency-matched microring resonators, this approach led to the first demonstration of flattop microphotonic filters meeting the stringent criteria for high-spectral-efficiency integrated add-drop multiplexers. The 40 GHz wide filters show a 20 nm free spectral range, 2 dB drop loss, and suppression of adjacent channels by over 30 dB.

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Ultrawide tuning of photonic microcavities via evanescent field perturbation.

Evanescent field perturbation of an integrated microring resonator is examined as a means of achieving high-fidelity reversible tuning of photonic microcavities over large wavelength ranges. A 1.7% wavelength tuning is achieved through the use of a novel silica fiber probe that provides access to the evanescent field of an air-clad high-index-contrast ring resonator. As the microring is perturbed, the probe-ring distance is found through simultaneous nanometric distance calibration and force measurements. Experimental results agree well with theoretical tuning. Possible microelectromechanical systems implementation of this effect is discussed, as well as avenues for improvement of the tuning range.

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Experimental characterization of focusing by high-numerical-aperture zone plates.

High-numerical-aperture zone plates have important applications in high-resolution optical maskless lithography as well as scanning confocal microscopy. We describe two methods to experimentally characterize the focusing properties, i.e., the point-spread function, of such diffractive lenses. The first method uses spot exposures in photoresist and the second uses a conventional knife-edge scan. The experimental results agree well with rigorous theoretical calculations.

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Absorbance-modulation optical lithography.

We describe a new mode of optical lithography called absorbance-modulation optical lithography (AMOL) in which a thin film of photochromic material is placed on top of a conventional photoresist and illuminated simultaneously by a focal spot of wavelength lambda1 and a ring-shaped illumination of wavelength lambda2. The lambda1 radiation converts the photochromic material from an opaque to a transparent configuration, thereby enabling exposure of the photoresist, while the lambda2 radiation reverses the transformation. As a result of these competing effects, the point-spread function that exposes the resist is strongly compressed, resulting in higher photolithographic resolution and information density. We show by modeling that the point-spread-function compression achieved via AMOL depends only on the absorbance distribution in the photostationary state. In this respect, absorbance modulation represents an optical nonlinearity that depends on the intensity ratio of lambda1 and lambda2 and not on the absolute intensity of either one alone. By inserting material parameters into the model, a lithographic resolution corresponding to lambda1/13 is predicted.

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High resolution printing of DNA feature on poly(methyl methacrylate) substrates using supramolecular nano-stamping.

In recent years, a large number of devices based on organic and biological materials have been developed. To scale-up the production of these systems to industrially acceptable standards, there is a need to develop soft-material stamping approaches with the needed resolution, complexity, and versatility. We have recently developed a DNA-based stamping method (supramolecular nano-stamping, SuNS) that has superior resolution and can print multiple molecules at the same time. A similar technique was independently developed by Crooks and co-workers. Here we show that SuNS can be used to efficiently print DNA features on a polymeric substrate (poly(methyl methacrylate), PMMA) with a 40 nm point resolution and a coverage that exceeds 100 mum2. The stamped PMMA substrate was also used as a master to print on a gold substrate. With PMMA being optically clear and electrically insulating, future applications of SuNS to print DNA micro- and nanoarrays are envisioned.

DNA, Single-Stranded↗

Supramolecular nanostamping: using DNA as movable type.

Here we present a novel printing technique (that we call supramolecular nanostamping), based on the replication of single-stranded DNA features through a hybridization-contact-dehybridization cycle. On a surface containing features each made of single-stranded DNA molecules of known sequence, the complementary DNA molecules are hybridized, spontaneously assembling onto the original pattern due to sequence-specific interactions. These complementary DNA strands, on the end that is assembled far from the original surface, are 5' modified with chemical groups ("sticky ends") that can form bonds with a target surface that is brought into contact. Heating induces dehybridization between DNA strands, leaving the original pattern on the original surface and the copied pattern on the secondary substrate, and thus stamping (see Figure 1). Molecular recognition provides the unique and disruptive ability of transferring large amounts of information in a single printing cycle, that is the simultaneous stamping of spatial information (i.e., the patterns) and of chemical information (i.e., the features' DNA sequence--their chemical composition). This method combines high resolution (<40 nm) with the advantage of an exponential increase in the number of masters; in fact, any printed substrate can be reused as a master. Patterns fabricated via very different lithographic techniques can be replicated.

DNA↗

Photon-sieve lithography.

We present the first lithography results that use high-numerical-aperture photon sieves as focusing elements in a scanning-optical-beam-lithography system [J. Vac. Sci. Technol. B 21, 2810 (2003)]. Photon sieves are novel optical elements that offer the advantages of higher resolution and improved image contrast compared with traditional diffractive optics such as zone plates [Nature 414, 184 (2001)]. We fabricated the highest-numerical-aperture photon sieves reported to date and experimentally verified their focusing characteristics. We propose two new designs of the photon sieve that have the potential to significantly increase focusing efficiency.

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A three-dimensional optical photonic crystal with designed point defects.

Photonic crystals offer unprecedented opportunities for miniaturization and integration of optical devices. They also exhibit a variety of new physical phenomena, including suppression or enhancement of spontaneous emission, low-threshold lasing, and quantum information processing. Various techniques for the fabrication of three-dimensional (3D) photonic crystals--such as silicon micromachining, wafer fusion bonding, holographic lithography, self-assembly, angled-etching, micromanipulation, glancing-angle deposition and auto-cloning--have been proposed and demonstrated with different levels of success. However, a critical step towards the fabrication of functional 3D devices, that is, the incorporation of microcavities or waveguides in a controllable way, has not been achieved at optical wavelengths. Here we present the fabrication of 3D photonic crystals that are particularly suited for optical device integration using a lithographic layer-by-layer approach. Point-defect microcavities are introduced during the fabrication process and optical measurements show they have resonant signatures around telecommunications wavelengths (1.3-1.5 microm). Measurements of reflectance and transmittance at near-infrared are in good agreement with numerical simulations.

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