Biomedical subjects

Hong Koo Baik

Publications and source records attributed to Hong Koo Baik.

3 recordsLinked to original sources

PubMed2006

Hydrophilic composite elastomeric mold for high-resolution soft lithography.

Here, we introduce a nanopatternable hydrophilic composite elastomer highly desirable for both nanostructure patterning via solvent-assisted micromolding (SAMIM) and microcontact printing of polar inks. This composite precursor is prepared by blending two UV-curable materials, Norland Optical Adhesives (NOA) 63 and poly(ethylene glycol) diacrylate (PEGDA), in an appropriate ratio; upon UV polymerization, a nanopatternable elastomer with preferential permeability both to aqueous and organic solvent is fabricated. Using this composite mold, nanoscale SAMIM of poly(4-vinylpyridine) (P4VP) and microcontact printing of a polar biomolecule, bovine serum albumin (BSA), was successfully demonstrated, paving the way for facile and efficient reproduction of various nanopatterns and a biomolecule-printed array platform.

Elastomers↗

PubMed2005

Novel alignment mechanism of liquid crystal on a hydrogenated amorphous silicon oxide.

The mechanism of liquid crystal (LC) alignment has been investigated during the last few decades for inorganic materials as well as for organic materials; however, it has not been clearly confirmed for some alignment materials. Inorganic alignment materials such as amorphous silicon oxide (a-SiOx) and hydrogenated amorphous silicon oxide (a-SiOx:H) are deposited on indium tin oxide (ITO) films on glass by reactive sputtering deposition. After deposition, the inorganic alignment materials are irradiated using an Ar+ ion beam (IB) for LC alignment. On the basis of the experimental results, a-SiOx films deposited by the sputtering do not align the LC, but a-SiOx:H films treated with varying IB energies, IB incident angles, IB doses, and IB irradiation times have excellent alignment properties and electrooptical properties, identical to those of polyimide (PI). These results imply that inorganic alignment layers irradiated by IB can be adopted as an LC alignment layer instead of rubbed PI. Additionally, hydrogen plays an important role in LC alignment because of the difference in alignment properties between a-SiOx films and a-SiOx:H films. We investigate the mechanism of IB-treated inorganic alignment layers and suggest that LCs are aligned by chemical effects, such as van der Waals interaction, more than by physical effects, such as morphology effects, in the inorganic alignment layer irradiated by IB.

Journal Article↗

PubMed2005

Effects of the polarizability and packing density of transparent oxide films on water vapor permeation.

The tin oxide and silicon oxide films have been deposited on polycarbonate substrates as gas barrier films, using a thermal evaporation and ion beam assisted deposition process. The oxide films deposited by ion beam assisted deposition show a much lower water vapor transmission rate than those by thermal evaporation. The tin oxide films show a similar water vapor transmission rate to the silicon oxide films in thermal evaporation but a lower water vapor transmission rate in IBAD. These results are related to the fact that the permeation of water vapor with a large dipole moment is affected by the chemistry of oxides and the packing density of the oxide films. The permeation mechanism of water vapor through the oxide films is discussed in terms of the chemical interaction with water vapor and the microstructure of the oxide films. The chemical interaction of water vapor with oxide films has been investigated by the refractive index from ellipsometry and the OH group peak from X-ray photoelectron spectroscopy, and the microstructure of the composite oxide films was characterized using atomic force microscopy and a transmission electron microscope. The activation energy for water vapor permeation through the oxide films has also been measured in relation to the permeation mechanism of water vapor. The diffusivity of water vapor for the tin oxide films has been calculated from the time lag plot, and its implications are discussed.

Algorithms↗