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John F Seely

Publications and source records attributed to John F Seely.

12 recordsLinked to original sources

Optics and mechanisms for the Extreme-Ultraviolet Imaging Spectrometer on the Solar-B satellite.

The Extreme-Ultraviolet Imaging Spectrometer (EIS) is the first of a new generation of normal-incidence, two-optical-element spectroscopic instruments developed for space solar extreme-ultraviolet astronomy. The instrument is currently mounted on the Solar-B satellite for a planned launch in late 2006. The instrument observes in two spectral bands, 170-210 A and 250-290 A. The spectrograph geometry and grating prescription were optimized to obtain excellent imaging while still maintaining readily achievable physical and fabrication tolerances. A refined technique using low ruling density surrogate gratings and optical metrology was developed to align the instrument with visible light. Slit rasters of the solar surface are obtained by mechanically tilting the mirror. A slit exchange mechanism allows selection among four slits at the telescope focal plane. Each slit is precisely located at the focal plane. The spectrograph imaging performance was optically characterized in the laboratory. The resolution was measured using the Mg iii and Ne iii lines in the range of 171-200 A. The He ii line at 256 A and Ne iii lines were used in the range of 251-284 A. The measurements demonstrate an equivalent resolution of ~2 arc sec? on the solar surface, in good agreement with the predicted performance. We describe the EIS optics, mechanisms, and measured performance.

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Laboratory calibration of the Extreme-Ultraviolet Imaging Spectrometer for the Solar-B satellite.

The laboratory end-to-end testing of the Extreme-Ultraviolet Imaging Spectrometer (EIS) for the Solar-B satellite is reported. A short overview of the EIS, which observes in two bands in the extreme-ultraviolet wavelength range, is given. The calibration apparatus is described, including details of the light sources used. The data reduction and analysis procedure are outlined. The wavelength calibration using a Penning source to illuminate the aperture fully is presented. We discuss the aperture determination using a radiometrically calibrated hollow-cathode-based source. We then give an account of the predicted and measured efficiencies from consideration of the efficiencies of individual optical elements in first order, an account of efficiencies out of band when radiation incident in one band is detected in the other, and efficiencies in multiple orders. The efficiencies measured in first order for in band and out of band are compared with the predictions and the sensitivity, and its uncertainties are derived. Application of the radiometric calibration is discussed.

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SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging.

Narrowband SiC/Tb and Si/Tb multilayers are fabricated with as much as a 23% normal-incidence reflectance near a 60 nm wavelength and spectral bandpass (FWHM) values of 9.4 and 6.5 nm, respectively. The structural properties of the films are investigated using extreme ultraviolet and x-ray reflectometry and transmission electron microscopy. Thermal stability is investigated in films annealed to as high as 300 degrees C. Because of their superior thermal stability, relatively high reflectance, and narrower spectral bandpass, Si/Tb multilayers are identified as optimal candidates for solar physics imaging applications, where the peak response can be tuned to important emission lines such as O v near 63.0 nm and Mg x near 61.0 nm. We describe our experimental procedures and results, discuss the implications of our findings, and outline prospects for improved performance.

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Response of a SiC photodiode to extreme ultraviolet through visible radiation.

The responsivity of a type 6H-SiC photodiode in the 1.5-400 nm wavelength range was measured using synchrotron radiation. The responsivity was 0.20 A/W at 270 nm and was less than 0.10 A/W in the extreme ultraviolet (EUV) region. The responsivity was calculated using a proven optical model that accounted for the reflection and absorption of the incident radiation and the variation of the charge collection efficiency (CCE) with depth into the device. The CCE was determined from the responsivity measured in the 200-400 nm wavelength range. By use of this CCE and the effective pair creation energy (7.2 eV) determined from x-ray absorption measurements, the EUV responsivity was accurately modeled with no free parameters. The measured visible-light sensitivity, although low compared with that of a silicon photodiode, was surprisingly high for this wide bandgap semiconductor.

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Terbium-based extreme ultraviolet multilayers.

We have fabricated periodic multilayers that comprise either Si/Tb or SiC/Tb bilayers, designed to operate as narrowband reflective coatings near 60 nm wavelength in the extreme ultraviolet (EUV). We find peak reflectance values in excess of 20% near normal incidence. The spectral bandpass of the best Si/Tb multilayer was measured to be 6.5 nm full width at half-maximum (FWHM), while SiC/Tb multilayers have a more broad response, of order 9.4 nm FWHM. Transmission electron microscopy analysis of Si/Tb multilayers reveals polycrystalline Tb layers, amorphous Si layers, and relatively large asymmetric amorphous interlayers. Thermal annealing experiments indicate excellent stability to 100 degrees C (1 h) for Si/Tb. These new multilayer coatings have the potential for use in normal incidence instrumentation in a region of the EUV where efficient narrowband multilayers have not been available until now. In particular, reflective Si/Tb multilayers can be used for solar physics applications where the coatings can be tuned to important emission lines such as O V near 63.0 nm and Mg X near 61.0 nm.

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Normal-incidence efficiencies of multilayer-coated laminar gratings for the extreme-ultraviolet imaging spectrometer on the solar-B mission.

The normal-incidence efficiencies of two laminar gratings and the reflectances of two parabolic mirrors with matching multilayer coatings were measured by monochromatic synchrotron radiation and were compared with modeling calculations. These optics were developed for the Extreme-Ultraviolet Imaging Spectrometer to be launched on the Japanese Solar-B mission. Each optic has two sectors coated with Mo/Si multilayers that reflect the 17-21-nm and 25-29-nm wave bands at normal incidence. The measured peak grating efficiencies are in the 8%-12% range and are in good agreement with efficiency calculations that account for the effects of groove profile and the microroughness as determined by atomic force microscopy.

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Mo/B4C/Si multilayer-coated photodiode with polarization sensitivity at an extreme-ultraviolet wavelength of 13.5 nm.

A silicon photodiode coated with an interface-engineered Mo/Si multilayer was developed as a polarization sensitive detector. The Mo/B4C/Si multilayer was designed to reflect 13.5-nm extreme-ultraviolet (EUV) radiation at an incident angle of 45 degrees, at which the maximum polarization sensitivity occurs. The sensitivity of this specially coated photodiode and its polarization responses were determined by measurement of the reflectance and transmittance of the multilayer coating with synchrotron radiation. The Mo/B4C/Si multilayer was found to reflect 69.9% of the s-polarized radiation and only 2.4% of the p-polarized radiation, thus transmitting approximately 0.2% s-polarized radiation and 8.4% p-polarized radiation at a 13.5-nm wavelength and a 45 degrees angle of incidence. A polarization ratio, (Tp - Ts)/(Tp + Ts), of 95% was achieved with sufficiently high sensitivity from this photodiode. This result demonstrates the high polarization sensitivity and the usefulness of multilayer-coated photodiodes as novel EUV polarimeters.

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Extreme-ultraviolet thin-film interference in an Al-Mg-Al multiple-layer transmission filter.

Thin-film interference has been observed in the transmittance of a filter consisting of 263.5-nm-thick magnesium with a 32.2-nm-thick aluminum layer on each side. The transmittance, measured by synchrotron radiation, has an oscillatory behavior in the 25-70-nm wavelength range. On the basis of the calculation of the transmittance, the oscillatory behavior results from interference associated with the relatively transmissive magnesium and aluminum layers and the reflection from the oxidized aluminum surface layers. The bandpass performance of magnesium and aluminum layers deposited on a silicon photodiode detector is presented.

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X-ray absolute calibration of the time response of a silicon photodiode.

The time-dependent response of a 1-mm2 silicon photodiode was characterized by use of pulsed synchrotron radiation in the 4- to 16-nm-wavelength range. Modeling the input radiation pulse and the electrical response of the photodiode allowed the photodiode's capacitance as a function of wavelength and applied bias voltage to be determined. The capacitance was in the 7- to 19-pF range and resulted in response fall times as small as 0.4 ns. The capacitance determined by pulsed x-ray illumination was in good agreement with the capacitance determined by pulsed optical laser illumination. The absolute responsivity was measured by comparison with the responsivity of a calibrated photodiode.

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Performance of normal-incidence molybdenum-yttrium multilayer-coated diffraction grating at a wavelength of 9 nm.

The first experimental investigation of a normal-incidence Mo-Y multilayer-coated diffraction grating operating at a 9-nm wavelength is reported. The substrate is a replica of a concave holographic ion-etched blazed grating with 2,400 grooves/mm and a 2-m radius of curvature. The measured peak efficiency in the -3 order is 2.7% at a wavelength of 8.79 nm. To our knowledge, this is the highest normal-incidence grating efficiency ever obtained in this wavelength region.

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Skylab 3600 groove/mm replica grating with a scandium-silicon multilayer coating and high normal-incidence efficiency at 38-nm wavelength.

A Sc-Si multilayer coating was applied to a replica of the 3600 groove/mm grating, developed for the SO82A spectroheliograph that flew on the Skylab mission, for the purpose of enhancing the normal-incidence efficiency in the extreme-ultraviolet region. The efficiency, measured at an angle of incidence of 6 degrees with synchrotron radiation, had a maximum value of 7.2% at a wavelength of 38 nm and was a factor of 3 higher than the efficiency of the gold-coated Skylab grating. The measured efficiency of the Sc-Si grating was in good agreement with the efficiency calculated by use of the modified integral method.

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Efficiencies of master, replica, and multilayer gratings for the soft-x-ray-extreme-ultraviolet range: modeling based on the modified integral method and comparisons with measurements.

The near-normal-incidence efficiencies of a 2400-groove/mm holographic master grating, a replica grating, and a multilayer grating are modeled in the soft-x-ray-extreme-ultraviolet (EUV) regions and are compared with efficiencies that are measured with synchrotron radiation. The efficiencies are calculated by the computer program PCGrate, which is based on a rigorous modified integral method. The theory of our integral method is described both for monolayer and multilayer gratings designated for the soft-x-ray-EUV-wavelength range. The calculations account for the groove profile as determined from atomic force microscopy with a depth scaling in the case of the multilayer grating and an average random microroughness (0.7 nm) for the short wavelengths. The refractive indices of the grating substrate and coatings have been taken from different sources because of the wide range of the wavelengths (4.5-50 nm). The measured peak absolute efficiency of 10.4% in the second diffraction order at a wavelength of 11.4 nm is achieved for the multilayer grating and is in good agreement with a computed value of approximately 11.5%. Rigorous modeling of the efficiencies of three similar gratings is in good overall agreement with the measured efficiency over a wide wavelength region. Additional calculations have indicated that relatively high normal incidence efficiency (of at least several percent) and large angular dispersion in the higher orders can be achieved in the 4.5-10.5-nm range by application of various multilayer coatings.

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