PubMed Health⌕ Search

Biomedical subjects

Jorge Pisonero

Publications and source records attributed to Jorge Pisonero.

5 recordsLinked to original sources
PubMed2006

Laser ablation inductively coupled plasma mass spectrometry for direct analysis of the spatial distribution of trace elements in metallurgical-grade silicon.

The spatial distribution and concentration of impurities in metallurgical-grade silicon (MG-Si) samples (97-99% w/w Si) were investigated by use of laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS). The spatial resolution (120 mum) and low limits of detection (mg kg(-1)) for quality assurance of such materials were studied in detail. The volume-dependent precision and accuracy of non-matrix-matched calibration for quantification of minor elements, using NIST SRM 610 (silicate standard), indicates that LA-ICP-MS is well suited to rapid process control of such materials. Quantitative results from LA-ICP-MS were compared with previously reported literature data obtained by use of ICP-OES and rf-GD-OES. In particular, the distribution of element impurities and their relationship to their different segregation coefficients in silicon is demonstrated.

Journal Article↗
PubMed2005

Depth profiling with modified dc-Grimm and rf-Grimm-type glow discharges operated with high gas flow rates and coupled to a high-resolution mass spectrometer.

The improved analytical capability of direct-current (dc) and radiofrequency (rf) "fast flow" glow discharges coupled to a sector field mass spectrometer (GD-SFMS) are presented. In particular, the effect of GD chamber design has been studied to obtain suitable crater shapes for depth-profile analysis of solid samples while maintaining the high sensitivity and stability of this source. In this study it was observed that the distance between the sample surface and the end of the flow tube is critical and so careful optimisation is needed. Under optimum conditions plane crater profiles, with high ion-signal sensitivity and sufficient stability, were obtained. The capability to determine qualitative and semi-quantitative depth profiles is presented here using, as model, a coated sample of certified thickness. Finally, the depth resolution achieved for qualitative depth profiles obtained by rf-GD-(SF)MS is compared with that for the well-established rf-GD optical emission spectroscopy (OES) technique.

Chemical Phenomena↗
PubMed2004

A radiofrequency glow-discharge-time-of-flight mass spectrometer for direct analysis of glasses.

A radiofrequency (rf) glow-discharge (GD) ion source coupled to a commercial on-axis time-of-flight mass spectrometer (TOFMS) has been developed for the direct analysis of non-conducting samples. Different instrumental configurations of the rf-GD source, including the optional use of a sampler cone and the possibility of allowing electrical floating of the discharge, were evaluated first with a conducting sample. Higher ion signals were obtained when the GD was electrically floating and no sampler cone was used. A homogeneous glass was then analyzed using two different rf-GD configurations--with a sampler cone and discarding the use of the sampler cone. The atomic mass spectra obtained with the TOFMS using both configurations were compared. Analyte signals were systematically higher for the latest mode which avoids the sampler cone. The analytical capability of the proposed rf-GD-TOFMS system for the analysis of thick glasses, up to 6 mm, has been investigated in terms of sensitivity, isotopic ratio accuracy, and mass-resolving power. Different homogeneous glasses (including glasses as thick as 6 mm) have been analyzed and major and minor elements were detected. Isotope ratio accuracies of about +/-1% and mass resolving powers of about 700 were observed.

Electromagnetic Fields↗
PubMed2004

Radiofrequency glow-discharge devices for direct solid analysis.

The enormous potential of radiofrequency glow discharges (rf-GD) as photon, atom, or ion sources, coupled to spectrometric techniques, for rapid direct analysis of almost any conductor, semiconductor, or insulating material with good in-depth resolution has been demonstrated world-wide. This outstanding performance has prompted a great effort to develop and characterise rf-GD for direct materials analysis in recent years. The state of the art of rf-GD coupled to atomic absorption spectrometry, optical emission spectrometry, and mass spectrometry for direct solid analysis is reviewed here. A description of the principles of operation of the rf-GD and attempts to model these discharges are also given. Rf-GD instrumentation, both developed at research laboratories and commercially available, is described. Several practical examples are given demonstrating the capabilities of these techniques for bulk and depth-profile analysis. Finally, the research gaps to be filled for full implementation of rf-GD spectrometric techniques in industry and research centres alike for materials science studies and technical development are discussed.

Journal Article↗