Biomedical subjects

Lin Pang

Publications and source records attributed to Lin Pang.

6 recordsLinked to original sources

PubMed2006

High-resolution surface plasmon resonance sensor based on linewidth-optimized nanohole array transmittance.

A high spectral resolution, 2D nanohole-array-based surface plasmon resonance sensor that operates at normal or near normal incidence--facilitating high spatial resolution imaging--is presented. The angular and spectral transmittance of the structure is modified from a Fano type to a pure Lorentzian line shape with a parallel and orthogonal polarizer-analyzer pair. This change leads to a linewidth narrowing that maximizes the sensor resolution, which we show to be of O(10(-5)) refractive index units (RIU). We estimate the potential of this system of O(10(-6)) RIU under optimal conditions.

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PubMed2006

Form-birefringent space-variant inhomogeneous medium element for shaping point-spread functions.

We experimentally characterize the properties of an element that generates a doughnutlike point-spread function by converting the linearly polarized incident field to radially or azimuthally polarized light utilizing space-variant inhomogeneous medium (SVIM) form-birefringent subwavelength structures. To fabricate the high-aspect-ratio SVIM structures, we developed a chemically assisted ion-beam-etching process that permits control of the fabricated form-birefringent structure profile to optimize the effect of birefringence and the impedance mismatch on the substrate-air interface. Fabricated elements perform efficient polarization conversion for incident angles as large as 30 degrees, where the extinction ratio is found to be better than 4.5. The intensity distribution in the far field shows that our SVIM device generates a doughnut point-spread function that may prove useful for various applications.

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PubMed2005

Form-birefringence structure fabrication in GaAs by use of SU-8 as a dry-etching mask.

A thin layer of a SU-8 submicrometer pattern produced by holographic lithography was directly used as the dry-etching mask in a chemically assisted ion-beam-etching system. With optimized etching parameters, etching selectivity of 7:1 was achieved together with a smooth vertical profile. As an application, a half-wavelength retardation plate for a 1.55-microm wavelength was produced and evaluated.

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PubMed2005

Implementation of a graded-index medium by use of subwavelength structures with graded fill factor.

We present a novel configuration for the implementation of subwavelength-based graded-index devices. The proposed concept is based on the etching of one-dimensional subwavelength gratings into a high-index slab waveguide to achieve the desired effective index distribution. A graded-index profile can be achieved by gradually modifying the duty ratio of the grating along the horizontal axis, while the beam is confined in the vertical direction by the slab waveguide. On the basis of this concept, novel graded-index lenses and waveguides are both proposed and characterized numerically by use of finite-difference time-domain and finite-element analysis. The proposed devices can be used for guiding, imaging, optical signal processing, mode matching, coupling, and other applications while offering the intrinsic advantages of on-chip integration such as miniaturization, eliminating the need to align each component separately, and compatibility with standard microfabrication techniques for manufacturability.

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PubMed2004

Engineering space-variant inhomogeneous media for polarization control.

Novel devices for converting a linear polarization state to radial or azimuthal polarization states are realized by use of space-variant inhomogeneous media on a subwavelength scale. The two designs presented use form birefringence to locally transform the polarization state. The devices are fabricated in a GaAs substrate for operation in the far-infrared wavelength range. The experimental characterization is in good agreement with the designs, demonstrating high conversion efficiency.

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PubMed2003

Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write.

We have developed an approach for relatively rapid and easy fabrication of large-area two-dimensional (2-D) photonic crystal structures with controlled defects in the lattice. The technique is based on the combination of two lithographic steps in UV-sensitive SU-8 photoresist. First, multiple exposures of interference fringes are used in combination with precise rotation of the sample to define a 2-D lattice of holes. Second, a strongly focused UV laser beam is used to define line-defect waveguides by localized exposure in the recorded but not yet developed lattice from the first step. After development, the mask is transferred into a GaAs substrate with dry etching in chemically assisted ion-beam etching.

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