Biomedical subjects

MG Lagally

Publications and source records attributed to MG Lagally.

At least 19 recordsLinked to original sources

PubMed2000

Diffusional kinetics of SiGe dimers on Si(100) using atom-tracking scanning tunneling microscopy

Quantitative measurements of the diffusion of adsorbed mixed Ge-Si dimers on the Si(100) surface have been made as a function of temperature using atom-tracking scanning tunneling microscopy. These mixed dimers are distinguishable from pure Si-Si dimers by their characteristic kinetics-a 180 degrees rotation between two highly buckled configurations. At temperatures at which the mixed dimers diffuse, atomic-exchange events occur, in which the Ge atom in the adsorbed dimer exchanges with a substrate Si atom. Reexchange can also occur when the diffusing Si-Si dimer revisits the original site of exchange.

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PubMed2000

Thermal roughening of a thin film: A new type of roughening transition

The equilibrium thermal roughening of thin Ge layers (one and two monolayers) deposited on Si(001) has been investigated with low-energy electron microscopy. A Ge-coverage-dependent roughening is observed. For two monolayers, the temperature at which imaging contrast is lost due to surface roughness is 900+/-25 degrees C, between the roughening temperatures of Ge(001) and Si(001). Lower Ge coverages move this temperature closer to that of Si(001). The roughening is confined to the Ge overlayers. It is believed that this phenomenon represents a new type of surface roughening transition that should be generally applicable for heteroepitaxial films.

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PubMed2000

Equilibrium shape of two-dimensional islands under stress

We show that the equilibrium shape anisotropy of two-dimensional islands in heteroepitaxial growth depends on island size, a consequence of the presence of strain. Even in homoepitaxy, in which the island shape has conventionally been equated with the ratio of step energies, a substrate surface stress anisotropy can influence island shape.

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PubMed2000

Nucleationless three-dimensional island formation in low-misfit heteroepitaxy

The formation of faceted three-dimensional islands during growth of low-misfit Si1-xGex alloys on Si(100) has been investigated by low-energy electron microscopy. The formation of the islands in these alloy systems does not involve three-dimensional nucleation, but rather proceeds via a precursor array of shallow, stepped mounds on the surface that result from the inherent morphological instability of the strained alloy film.

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PubMed2000

Scanning tunneling microscopy identification of atomic-scale intermixing on Si(100) at submonolayer Ge coverages

The positions of Ge atoms intermixed in the Si(100) surface at very low concentration are identified using empty-state imaging in scanning tunneling microscopy. A measurable degree of place exchange occurs at temperatures as low as 330 K. Contrary to earlier conclusions, good differentiation between Si atoms and Ge atoms can be achieved by proper imaging conditions.

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PubMed1997

Adatom pairing structures for Ge on si(100): the initial stage of island formation

With the use of scanning tunneling microscopy, it is shown that germanium atoms adsorbed on the (100) surface of silicon near room temperature form chainlike structures that are tilted from the substrate dimer bond direction and that consist of two-atom units arranged in adjoining substrate troughs. These units are distinctly different from surface dimers. They may provide the link missing in our understanding of the elementary processes in epitaxial film growth: the step between monomer adsorption and the initial formation of two-dimensional growth islands.

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PubMed1997

Atomistic Processes in the Early Stages of Thin-Film Growth

Growth of thin films from atoms deposited from the gas phase is intrinsically a nonequilibrium phenomenon governed by a competition between kinetics and thermodynamics. Precise control of the growth and thus of the properties of deposited films becomes possible only after an understanding of this competition is achieved. Here, the atomic nature of the most important kinetic mechanisms of film growth is explored. These mechanisms include adatom diffusion on terraces, along steps, and around island corners; nucleation and dynamics of the stable nucleus; atom attachment to and detachment from terraces and islands; and interlayer mass transport. Ways to manipulate the growth kinetics in order to select a desired growth mode are briefly addressed.

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PubMed1996