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Oana G Cula

Publications and source records attributed to Oana G Cula.

2 recordsLinked to original sources

Polarization multiplexing and demultiplexing for appearance-based modeling.

Polarization has been used in numerous prior studies for separating diffuse and specular reflectance components, but in this work we show that it also can be used to separate surface reflectance contributions from individual light sources. Our approach is called polarization multiplexing and it has a significant impact in appearance modeling where the image as a function of illumination direction is needed. Multiple unknown light sources can illuminate the scene simultaneously, and the individual contributions to the overall surface reflectance are estimated. Polarization multiplexing relies on the relationship between the light source direction and the intensity modulation. Inverting this transformation enables the individual intensity contributions to be estimated. In addition to polarization multiplexing, we show that phase histograms from the intensity modulations can be used to estimate scene properties including the number of light sources.

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Bidirectional imaging and modeling of skin texture.

In this paper, we present a method of skin imaging called bidirectional imaging that captures significantly more properties of appearance than standard imaging. The observed structure of the skin's surface is greatly dependent on the angle of incident illumination and the angle of observation. Specific protocols to achieve bidirectional imaging are presented and used to create the Rutgers Skin Texture Database (clinical component). This image database is the first of its kind in the dermatology community. Skin images of several disorders under multiple controlled illumination and viewing directions are provided publicly for research and educational use. Using this skin texture database, we employ computational surface modeling to perform automated skin texture classification. The classification experiments demonstrate the usefulness of the modeling and measurement methods.

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