Biomedical subjects

Sushil K Satija

Publications and source records attributed to Sushil K Satija.

7 recordsLinked to original sources

PubMed2006

Nanoscale surface patterns from 10(3) single molecule helices of biodegradable poly(L-lactic acid).

Atomic force microscopy, reflection absorption infrared spectroscopy, and X-ray reflectivity studies reveal that poly(L-lactic acid) molecules in Langmuir-Blodgett (LB) films exist as 10(3) helices over nearly the entire length of the polymer chain. This feature gives rise to LB films with highly ordered nanoscale smectic liquid crystalline-like surface patterns with low surface roughness and lamellar spacings that scale with molar mass. These studies provide a new approach for controlling surface morphology with a biodegradable polymer commonly used for drug delivery and tissue engineering.

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PubMed2005

Direct measurement of the counterion distribution within swollen polyelectrolyte films.

The depth profile of the counterion concentration within thin polyelectrolyte films was measured in situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find substantial counterion depletion near the substrate and enrichment near the periphery of the film extending into the solution. These observations challenge our understanding of the charge distribution in polyelectrolyte films and are important for understanding film dissolution in medical and technological applications.

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PubMed2005

Supramolecular ordering of tripod dyes at the air/water interface.

Monolayers of 2-(3,4,5-(trisdodecyloxyl)phenyl)[1,3,4]oxadiazole based "tripod" dye, P2G, has been studied at the air/water interface with in situ X-ray reflectivity. Compression of the disordered Langmuir-Blodgett monolayer film induces a transition to a unique ordered phase, representing a supramolecular assembly with a unique spatial distribution and orientation of the molecules. At low pressure, the molecules having face-on orientation are interdigitated by the three arms. After first transition in the pi-A isotherm, the molecular conformation is turned into an edge-on orientation, where the molecules are self-assembled into supramolecular structures.

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PubMed2005

Control of moisture at buried polymer/alumina interfaces through substrate surface modification.

Moisture absorption in poly(4-tert-butoxycarbonyloxystyrene) (PBOCSt) films supported on Al(2)O(3) sputter coated silicon wafers is measured using neutron and X-ray reflectivity. Accumulation of water at the interface during moisture exposure results in an apparent film-thickness-dependent swelling for ultrathin PBOCSt films. The swelling of a film on Al(2)O(3) is less than the swelling of a film of the same thickness on SiO(x) for films thinner than 20 nm. This is due to comparatively less moisture accumulation at the Al(2)O(3)/PBOCSt interface. A simple, zero adjustable parameter model consisting of a fixed water-rich layer at the interface and bulk swelling through the remainder of the film describes the thickness-dependent swelling quantitatively. The influence of four different Al(2)O(3) surface treatments on the moisture distribution within PBOCSt films was examined: bare Al(2)O(3), tert-butylphosphonic acid, phenylphosphonic acid, and n-octyltrichlorosilane. Both the phenyl and the octyl surface treatments reduce the accumulation of water at the polymer/substrate interface. The tert-butyl treatment does not reduce the interfacial water concentration, presumably due to insufficient surface coverage.

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PubMed2004

Interfacial effects on moisture absorption in thin polymer films.

Moisture absorption in model photoresist films of poly(4-hydroxystryene) (PHOSt) and poly(tert-butoxycarboxystyrene) (PBOCSt) supported on silicon wafers was measured by X-ray and neutron reflectivity. The overall thickness change in the films upon moisture exposure was found to be dependent upon the initial film thickness. As the film becomes thinner, the swelling is enhanced. The enhanced swelling in the thin films is due to the attractive nature of the hydrophilic substrate, leading to an accumulation of water at the silicon/polymer interface and subsequently a gradient in concentration from the enhancement at the interface to the bulk concentration. As films become thinner, this interfacial excess dominates the swelling response of the film. This accumulation was confirmed experimentally using neutron reflectivity. The water rich layer extends 25 +/- 10 A into the film with a maximum water concentration of approximately 30 vol %. The excess layer was found to be polymer independent despite the order of magnitude difference in the water solubility in the bulk of the film. To test if the source of the thickness dependent behavior was the enhanced swelling at the interface, a simple, zero adjustable parameter model consisting of a fixed water rich layer at the interface and bulk swelling through the remainder of the film was developed and found to reasonably correspond to the measured thickness dependent swelling.

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PubMed2002

Density-fluctuation-induced swelling of polymer thin films in carbon dioxide.

We report an anomalous swelling of polymer thin films in carbon dioxide (CO(2)) which is associated (in both locus and form) with the density fluctuation ridge that forms along the extension of the coexistence curve of gas and liquid in the P-T phase diagram. Neutron reflectivity results showed that CO(2) could be sorbed to a large extent ( approximately 60%) in thin polymer films even when the bulk miscibility of the polymer with CO(2) is very poor. The anomalous swelling is found to scale with the polymer radius of gyration (R(g)) and extends to a distance approximately 10 R(g).

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PubMed2002

Direct measurement of the reaction front in chemically amplified photoresists.

The continuing drive by the semiconductor industry to fabricate smaller structures using photolithography will soon require dimensional control at length scales comparable to the size of the polymeric molecules in the materials used to pattern them. The current technology, chemically amplified photoresists, uses a complex reaction-diffusion process to delineate patterned areas with high spatial resolution. However, nanometer-level control of this critical process is limited by the lack of direct measurements of the reaction front. We demonstrate the use of x-ray and neutron reflectometry as a general method to measure the spatial evolution of the reaction-diffusion process with nanometer resolution. Measuring compositional profiles, provided by deuterium-labeled reactant groups for neutron scattering contrast, we show that the reaction front within the material is broad rather than sharply defined and the compositional profile is altered during development. Measuring the density profile, we directly correlate the developed film structure with that of the reaction front.

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