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Thomas M Owens

Publications and source records attributed to Thomas M Owens.

8 recordsLinked to original sources

Formation of mixed monolayers of silsesquioxanes and alkylsilanes on gold.

The formation of mixed monolayers of hydridospherosilsesquioxane clusters (H(8)Si(8)O(12)) and alkylsilanes (H(2n+1)C(n)SiH(3)) on Au has been investigated using X-ray photoelectron and reflection-absorption infrared spectroscopies and scanning tunneling microscopy. All of the techniques indicate the displacement of the majority of the siloxane clusters from the surface in favor of the alkylsilane.

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Octylgermane on gold: synthesis, oxidation, and pattern formation.

Chemisorbed monolayers of octylgermane (C8H17GeH3) on gold have been formed by vapor deposition in ultrahigh vacuum. The monolayer has been characterized by X-ray photoelectron and reflection absorption infrared spectroscopies (XPS and RAIRS) and scanning tunneling microscopy (STM). XPS data indicate the monolayer can be oxidized by exposure to ozone. STM images exhibit a complex pattern which can be modeled as strain-mediated spinodal decomposition.

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Oxidation of alkylsilane-based monolayers on gold.

The oxidation of alkylsilane monolayers on Au has been studied by X-ray photoelectron spectroscopy, reflection-absorption infrared spectroscopy, contact-angle measurements, and scanning tunneling microscopy. Exposure of the monolayers at 298 K to pure O(2) or H(2)O (>5 x 10(-5) Torr and >150 000 L) does not cause oxidation. Ambient atmosphere only causes oxidation if direct sight lines are maintained to the sample. Ozone exposure results in rapid monolayer oxidation. Oxidation initially occurs only at the Si atom, resulting in formation of a cross-linked siloxane monolayer that retains alkyl surface termination. Prolonged ozone exposures result in the oxidation and subsequent loss of the alkyl chain.

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Monolayer pattern evolution via substrate strain-mediated spinodal decomposition.

Investigations of octylsilane (C8H17SiH3) monolayer pattern formation on Au(111) are reported. Scanning tunneling microscopy data display the evolution of a approximately 6 nm scale pattern of interwoven features concomitant with ejection of surface Au atoms and relaxation of the Au(111) 23xsqrt[3] surface reconstruction. Numerical simulations suggest the surface dynamics are governed by a substrate strain-mediated spinodal decomposition mechanism, novel to organic monolayer formation. Collectively, the experimental and theoretical data indicate strain-inducing Si-Au bond interactions drive the pattern formation and the alkyl chains play a negligible role.

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C-H activation of ethers and alkanes by germylene-aryl halide complexes.

Regioselective, room-temperature C-H activation of alkanes and ethers by stable germylenes and aryl halides is reported. Germylenes, Ge[CH(SiMe3)2]2 and Ge[N(SiMe3)2]2, and aryl halides, PhI, PhBr, and PhCl, have been employed. High yields of C-H activation products can be obtained through the use of high-dilution techniques.

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Formation of alkylsilane-based monolayers on gold.

The formation of monolayers of alkylsilanes on a gold surface is characterized by X-ray photoelectron and reflection-absorption infrared spectroscopies. The reaction occurs through the activation of multiple Si-H bonds. Reactivity of the newly synthesized systems to oxygen and water is reported.

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The differential reactivity of octahydridosilsesquioxane on Si(100)-2x1 and Si(111)-7x7: a comparative experimental study.

Scanning tunneling microscopy (STM), in conjunction with X-ray photoemission (XPS) and reflection-absorption infrared (RAIRS) spectroscopy, has been used to investigate the reaction of octahydridosilsesquioxane clusters (H(8)Si(8)O(12)) on the Si(100)-2x1 and Si(111)-7x7 surfaces. The clusters exhibit a markedly different reactivity upon exposure to the two clean silicon surfaces. STM data is presented that, in conjunction with XPS and RAIRS data, provides numerous constraints upon possible geometries for the chemisorbed clusters. The sum of the data is consistent with a dissociative reaction mechanism on Si(100)-2x1, resulting in cluster attachment to the surface via a single vertex. Conversely, data of Si(111)-7x7 subject to a saturation exposure of H(8)Si(8)O(12) is presented that is highly suggestive of cluster decomposition on the surface.

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