@misc{indiciae93f86c49c19a,
  title = {Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit},
  author = {AN Boto and P Kok and DS Abrams and SL Braunstein and CP Williams and JP Dowling},
  year = {2000},
  doi = {10.1103/physrevlett.85.2733},
  url = {https://pubmed.ncbi.nlm.nih.gov/10991220/},
  note = {Source identifier: 10991220}
}