TY  - RPRT
TI  - Osmium-metal coating device using hollow-cathode plasma CVD method.
AU  - H Akahori
AU  - M Handa
AU  - H Yoshida
AU  - Y Kozuka
PY  - 2000
DO  - 10.1093/oxfordjournals.jmicro.a023866
UR  - https://pubmed.ncbi.nlm.nih.gov/11270854/
ID  - 11270854
ER  -