@misc{indiciae4bc3b129047a,
  title = {Spontaneous roughening: fundamental limits in Si(100) halogen etch processing.},
  author = {Cari F Herrmann and Dongxue Chen and John J Boland},
  year = {2002},
  doi = {10.1103/physrevlett.89.096102},
  url = {https://pubmed.ncbi.nlm.nih.gov/12190417/},
  note = {Source identifier: 12190417}
}