TY  - RPRT
TI  - Spontaneous roughening: fundamental limits in Si(100) halogen etch processing.
AU  - Cari F Herrmann
AU  - Dongxue Chen
AU  - John J Boland
PY  - 2002
DO  - 10.1103/physrevlett.89.096102
UR  - https://pubmed.ncbi.nlm.nih.gov/12190417/
ID  - 12190417
ER  -