TY  - RPRT
TI  - Pattern selection during electropolishing due to double-layer effects.
AU  - Vadim V. Yuzhakov
AU  - Pavlo V. Takhistov
AU  - Albert E. Miller
AU  - Hsueh-Chia Chang
PY  - 1999
DO  - 10.1063/1.166380
UR  - https://pubmed.ncbi.nlm.nih.gov/12779802/
ID  - 12779802
ER  -