TY  - RPRT
TI  - Layer-by-layer design method for multilayers with barrier layers: application to Si/Mo multilayers for extreme-ultraviolet lithography.
AU  - Juan I Larruquert
PY  - 2004
DO  - 10.1364/josaa.21.001750
UR  - https://pubmed.ncbi.nlm.nih.gov/15384442/
ID  - 15384442
ER  -