@misc{indiciaee79b87ae6aa9,
  title = {Hafnium oxide and zirconium oxide atomic layer deposition: initial precursor and potential side-reaction product pathways with H/Si(100)-2 x 1.},
  author = {Ryan D Fenno and Mathew D Halls and Krishnan Raghavachari},
  year = {2005},
  doi = {10.1021/jp048663g},
  url = {https://pubmed.ncbi.nlm.nih.gov/16863156/},
  note = {Source identifier: 16863156}
}