TY  - RPRT
TI  - Hafnium oxide and zirconium oxide atomic layer deposition: initial precursor and potential side-reaction product pathways with H/Si(100)-2 x 1.
AU  - Ryan D Fenno
AU  - Mathew D Halls
AU  - Krishnan Raghavachari
PY  - 2005
DO  - 10.1021/jp048663g
UR  - https://pubmed.ncbi.nlm.nih.gov/16863156/
ID  - 16863156
ER  -