TY  - RPRT
TI  - Vacancy-assisted diffusion in silicon: a three-temperature-regime model.
AU  - Damien Caliste
AU  - Pascal Pochet
PY  - 2006
DO  - 10.1103/physrevlett.97.135901
UR  - https://pubmed.ncbi.nlm.nih.gov/17026047/
ID  - 17026047
ER  -