@misc{indiciae90e2df25dbb9,
  title = {Silicide formation at the Ti/Si(111) interface: Diffusion parameters and behavior at elevated temperatures.},
  author = {SA Chambers and DM Hill and F Xu and JH Weaver},
  year = {1987},
  doi = {10.1103/physrevb.35.634},
  url = {https://pubmed.ncbi.nlm.nih.gov/9941446/},
  note = {Source identifier: 9941446}
}