TY  - RPRT
TI  - Silicide formation at the Ti/Si(111) interface: Diffusion parameters and behavior at elevated temperatures.
AU  - SA Chambers
AU  - DM Hill
AU  - F Xu
AU  - JH Weaver
PY  - 1987
DO  - 10.1103/physrevb.35.634
UR  - https://pubmed.ncbi.nlm.nih.gov/9941446/
ID  - 9941446
ER  -