PubMed · 1028206
High resolution shadowing for electron microscopy by sputter deposition.
Abstract
The sputtering process by an ion beam well collimated and highly accelerated provides a valuable means of high resolution shadowing, replication of a fine object by a combination of pre-shadowing and deposition as well as a preparation of supporting films. High resolution shadowing and films with grains smaller than 1 nm can be obtained by argon ion-sputtering targets of tungsten and tungsten/tantalum alloy. The resolution of carbon replicas pre-shadowed with tungsten/tantalum is determined from the radius of curvature of replicated magnesium oxide crystal corners.
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K Adachi, K Hojou, M Katoh, K Kanaya. 1976. High resolution shadowing for electron microscopy by sputter deposition.. https://doi.org/10.1016/s0304-3991(76)90212-6
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