Edge transfer lithography using alkanethiol inks.

Ruben B A Sharpe; Bram J F Titulaer; Emiel Peeters; Dirk Burdinski; Jurriaan Huskens; Harold J W Zandvliet; David N Reinhoudt; Bene Poelsema

doi:10.1021/nl0607885

PubMed · 16771586

Edge transfer lithography using alkanethiol inks.

Ruben B A Sharpe·Bram J F Titulaer·Emiel Peeters·Dirk Burdinski·Jurriaan Huskens·Harold J W Zandvliet·David N Reinhoudt·Bene Poelsema

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Abstract

Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.

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Alkanes Gold Ink Materials Testing Nanostructures Nanotechnology Particle Size Printing Sulfhydryl Compounds Surface Properties Journal Article

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Ruben B A Sharpe, Bram J F Titulaer, Emiel Peeters, Dirk Burdinski, Jurriaan Huskens, Harold J W Zandvliet, David N Reinhoudt, Bene Poelsema. 2006. Edge transfer lithography using alkanethiol inks.. https://doi.org/10.1021/nl0607885

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