Computer experiments for tilted beam dark-field imaging.

Abstract

Simulated high resolution tilted beam dark-field electron micrographs for the conventional transmission microscope were obtained by performing wave optical calculations with a high speed computer. Various organometallic molecules and point defects in crystals were studied to assess whether the image structures resembled the orginal object in terms of atom positions and atom correlations for a variety of microscope conditions. For the organometallic molecules close agreement was found between actual experimental micrographs and calculated images for specific combinations of microscope parameters. The images of point defects indicate that it should be possible to identify these structures based upon image size and intensity which in turn are highly dependent on the strain field surrounding the defect.