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Comment on "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit".

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G S Agarwal, R W Boyd, E M Nagasako, S J Bentley. 2001-02-12. Comment on "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit".. https://doi.org/10.1103/physrevlett.86.1389

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